Author: Dimitrov D.B. Koprinarova J. Pazov J. Angelov C.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.58, Iss.2, 2000-08, pp. : 344-350
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Conductivity of nanometer TiO 2 thin films by magnetron sputtering
By Gu G.-R. He Z. Tao Y.-c. Li Y.-a. Li J.-j. Yin H. Li W.-q. Zhao Y.-n.
Vacuum, Vol. 70, Iss. 1, 2003-02 ,pp. :
Dielectric properties of TiO 2 -films reactively sputtered from Ti in an RF magnetron
By Alexandrov P. Koprinarova J. Todorov D.
Vacuum, Vol. 47, Iss. 11, 1996-11 ,pp. :
Raman spectroscopy analysis of magnetron sputtered RuO 2 thin films
By Meng L.-j. Teixeira V. dos Santos M.P.
Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. :
Preferential growth of thin rutile TiO 2 films upon thermal oxidation of sputtered Ti films
By Ting C.-C. Chen S.-Y. Liu D.-M.
Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. :