Application of strongly ionized AC tokamak plasma for synthesis of TiN thin films

Author: Ye M.Y.   Matsuda O.   Ohno N.   Uesugi Y.   Takagi M.   Takamura S.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.59, Iss.1, 2000-10, pp. : 55-62

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Abstract