Effect of the hydrogen partial pressure ratio on the properties of c-Si:H films prepared by rf magnetron sputtering

Author： Makihara H. Tabata A. Suzuoki Y. Mizutani T.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.59, Iss.2, 2000-11, pp. : 785-791

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