Author： Zajckova L. Veltruska K. Tsud N. Franta D.
Publisher： Elsevier
ISSN： 0042-207X
Source： Vacuum, Vol.61, Iss.2, 2001-05, pp. : 269-273
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
An experimental study of an interface reaction at the practical Pd/Si interface by XPS
Vacuum, Vol. 46, Iss. 2, 1995-02 ,pp. :
Access to resources
Recommend
Ellipsometric studies of porous silicon
By Makara V.A. Odarych V.A. Vakulenko O.V. Dacenko O.I.
Thin Solid Films, Vol. 342, Iss. 1, 1999-03 ,pp. :
XPS and AFM study of chemical mechanical polishing of silicon nitride
By Yang G.-R. Zhao Y.-P. Hu Y.Z. Paul Chow T. Gutmann R.J.
Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. :