Author: Suchaneck G. Lin W.-M. Koehler R. Sandner T. Gerlach G. Krawietz R. Pompe W. Deineka A. Jastrabik L.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 473-478
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Structural characteristics of RF-sputtered BaTiO 3 thin films
By Preda L. Courselle L. Despax B. Bandet J. Ianculescu A.
Thin Solid Films, Vol. 389, Iss. 1, 2001-06 ,pp. :
Dielectric properties of RF-sputtered silicon nitride thin films with gold electrodes
Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. :
Crystallization behavior of r.f.-sputtered TiNi thin films
Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. :