Author: Kopani M. Mikula M. Jergel M. Falcony C. Ortega L. Pinck E.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.67, Iss.1, 2002-09, pp. : 149-153
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Effect of ion implantation on the structural properties of a-Si:H films
By Danesh P. Pantchev B. Savatinova I. Liarokapis E. Schmidt B.
Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. :
Role of ion bombardment on the properties of a-Si:H films
By Aguas H. Martins R. Fortunato E.
Vacuum, Vol. 60, Iss. 1, 2001-01 ,pp. :
Influence of a-Si:H deposition by catalytic CVD on transparent conducting oxides
By Imamori K. Masuda A. Matsumura H.
Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. :
Doping effects on the optical properties of evaporated a-Si:H films
Thin Solid Films, Vol. 360, Iss. 1, 2000-02 ,pp. :