Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments

By  

Plasma Sources Science and Technology, Vol. 23, Iss. 6, 2014-12 ,pp. : 65049-65059

IOP Publishing

Access to resources Recommend Favorite

Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas

By Bruneau B   Novikova T   Lafleur T   Booth J P   Johnson E V  

Plasma Sources Science and Technology, Vol. 24, Iss. 1, 2015-02 ,pp. : 15021-15030

IOP Publishing

Access to resources Recommend Favorite

The influence of electron reflection/sticking coefficients at the electrodes on plasma parameters in particle-in-cell simulations of capacitive radio-frequency plasmas

By Korolov I   Derzsi A   Donkó Z   Schüngel E   Schulze J  

Plasma Sources Science and Technology, Vol. 25, Iss. 1, 2016-02 ,pp. : 15024-15037

IOP Publishing

Access to resources Recommend Favorite

Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms

By Bruneau B   Novikova T   Lafleur T   Booth J P   Johnson E V  

Plasma Sources Science and Technology, Vol. 23, Iss. 6, 2014-12 ,pp. : 65010-65018

IOP Publishing

Access to resources Recommend Favorite

Theory for the self-bias formation in capacitively coupled plasmas excited by arbitrary waveforms

By Lafleur T   Chabert P   Turner M M   Booth J P  

Plasma Sources Science and Technology, Vol. 22, Iss. 6, 2013-12 ,pp. : 65013-65023

IOP Publishing

Access to resources Recommend Favorite