Gettering by helium implantation applied to a device: impact of metal and dopant segregation

Author: Alquier D.   Cayrel F.   Ventura L.   Roqueta F.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 496-503

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Abstract