Effect of Cl/H input ratio on the growth rate of MoSi 2 coatings formed by chemical vapor deposition of Si on Mo substrates from SiCl 4 -H 2 precursor gases

Author: Yoon J.-K.   Kim G.-H.   Byun J.-Y.   Lee J.-K.   Yoon H.-S.   Hong K.-T.  

Publisher: Elsevier

ISSN: 0257-8972

Source: Surface and Coatings Technology, Vol.172, Iss.2, 2003-07, pp. : 176-183

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