A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry using synchrotron radiation

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Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2039-2048

Elsevier

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Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers

By Streli C.   Pepponi G.   Wobrauschek P.   Zoger N.   Pianetta P.   Baur K.   Pahlke S.   Fabry L.   Mantler C.   Kanngieszer B.   Malzer W.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2105-2112

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Analysis of low Z elements on Si wafer surfaces with undulator radiation induced total reflection X-ray fluorescence at the PTB beamline at BESSY II

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Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2113-2121

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Elemental concentration in the cortex and hippocampus of Wistar rats by X-ray total reflection fluorescence with synchrotron radiation

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Journal of Radioanalytical and Nuclear Chemistry, Vol. 269, Iss. 3, 2006-09 ,pp. : 647-652

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Analysis of mineral water from Brazil using total reflection X-ray fluorescence by synchrotron radiation

By Costa A.C.M.   Anjos M.J.   Moreira S.   Lopes R.T.   de Jesus E.F.O.  

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