Author: Caballero J. Park Y. Cabbibo A. Childress J.
Publisher: Springer Publishing Company
ISSN: 1543-186X
Source: Journal of Electronic Materials, Vol.26, Iss.11, 1997-11, pp. : 1274-1278
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Thermal stability study of NiSi and NiSi 2 thin films
By Zhao F.F. Zheng J.Z. Shen Z.X. Osipowicz T. Gao W.Z. Chan L.H.
Microelectronic Engineering, Vol. 71, Iss. 1, 2004-01 ,pp. :
By Santos-Ortiz Reinaldo Sun Wei Nyandoto Gilbert Du Jincheng Shepherd Nigel D
Semiconductor Science and Technology, Vol. 29, Iss. 11, 2014-11 ,pp. :