Thermal stability study of NiSi and NiSi 2 thin films

Author: Zhao F.F.   Zheng J.Z.   Shen Z.X.   Osipowicz T.   Gao W.Z.   Chan L.H.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.71, Iss.1, 2004-01, pp. : 104-111

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