Ion beam-assisted planarization of chemically vapor deposited diamond thin films using electron cyclotron resonance plasma

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Springer Publishing Company

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Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications

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A comparative study of boron and phosphorus doping effects in SiC : H films prepared by electron cyclotron resonance plasma CVD

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Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets

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Dry etching of III-V semiconductors in IBr/Ar electron cyclotron resonance plasmas

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