Study of amorphous Ta 2 O 5 thin films by DC magnetron reactive sputtering

Author: Chen K.   Nielsen M.   Yang G.   Rymaszewski E.   Lu T.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.4, 1997-04, pp. : 397-401

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract