Materials Science in Semiconductor Processing,volume 5,issue 2  (04-2003)

Period of time: 2003年2期

Publisher: Elsevier

Founded in: 1998

Total resources: 4

ISSN: 1369-8001

Subject: TN Radio Electronics, Telecommunications Technology

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Materials Science in Semiconductor Processing,volume 5,issue 2

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MOCVD for complex multicomponent thin films-a leading edge technology for next generation devices

By Schumacher M., Lindner J., Baumann P.K., Schienle F., Solayappan N., Joshi V., Araujo C.A., McMillan L.D. in (2002)

Materials Science in Semiconductor Processing,volume 5,issue 2 , Vol. 5, Iss. 2, 2002-04 , pp. 85-91

Elsevier

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Influence of growth parameters on properties of electroceramic thin films grown via MO-CVD

By Padeletti G., Viticoli M., Cusma A., Ingo G.M., Santoni A., Loreti S., Minarini C., Viticoli S. in (2002)

Materials Science in Semiconductor Processing,volume 5,issue 2 , Vol. 5, Iss. 2, 2002-04 , pp. 105-114

Elsevier

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