Fabrication of a TEM sample of ion-irradiated material using focused ion beam microprocessing and low-energy Ar ion milling

By Jin Hyung-Ha   Shin Chansun   Kwon Junhyun  

Journal of Electron Microscopy, Vol. 59, Iss. 6, 2010-12 ,pp. : 463-468

Oxford University Press

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Specimen preparation for high-resolution transmission electron microscopy using focused ion beam and Ar ion milling

By Sasaki Hirokazu  

Journal of Electron Microscopy, Vol. 53, Iss. 5, 2004-10 ,pp. : 497-500

Oxford University Press

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Side-milling technique of preparing device cross-sections for electron holography based on a focused ion beam micro-sampling system

By Wang Zhouguang   Kato Takeharu   Hirayama Tsukasa  

Journal of Electron Microscopy, Vol. 53, Iss. 5, 2004-10 ,pp. : 489-491

Oxford University Press

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In Situ Microlithography of Si and GaAs by a Focused Ion Beam in a 200 keV TEM

By Furuya Kazuo   Saito Tetsuya   Yamada Isamu   Hata Takao  

Journal of Electron Microscopy, Vol. 45, Iss. 4, 1996-08 ,pp. : 291-297

Oxford University Press

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Development of a cryogenic stage for an ion-milling instrument

By Terauchi Masami   Satou Futami   Sugizaki Hideo   Suganuma Katsuaki  

Journal of Electron Microscopy, Vol. 60, Iss. 1, 2011-02 ,pp. : 25-27

Oxford University Press

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