ZnO Thin Films with Hole Conduction Produced by N+ Ion Implantation and Oxygen-Radical Annealing

Author： Georgobiani A. N.   Gruzintsev A. N.   Volkov V. T.   Vorob'ev M. O.   Dravin V. A.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.33, Iss.3, 2004-05, pp. : 165-168

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