Structural properties and electrical resistivity of TiN_x and Ti_1−xAl_xN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

By Irudayaraj A. A.   Kuppusami P.   Kalainathan S.  

Surface Engineering, Vol. 24, Iss. 1, 2008-01 ,pp. : 28-35

Maney Publishing

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Structural, mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering

By Arslan E.  

Surface Engineering, Vol. 26, Iss. 8, 2010-11 ,pp. : 615-619

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Microstructural, nanomechanical and antibacterial properties of magnetron sputtered nanocomposite thin films of CrN/Cu

By Kuppusami P   Elangovan T   Murugesan S   Thirumurugesan R   Khan S   George R P   Ramaseshan R   Divakar R   Mohandas E   Mangalaraj D  

Surface Engineering, Vol. 28, Iss. 2, 2012-03 ,pp. : 134-140

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Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

By Irudayaraj A. A.   Kuppusami P.   Thirumurugesan R.   Mohandas E.   Kalainathan S.   Raghunathan V. S.  

Surface Engineering, Vol. 23, Iss. 1, 2007-01 ,pp. : 7-11

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Effects of sputtering power on mechanical properties of Cr films deposited by magnetron sputtering

By Kim K.   Park M.   Lee W.   Kim H. W.   Lee J. G.   Lee C.  

Materials Science and Technology, Vol. 24, Iss. 7, 2008-07 ,pp. : 838-842

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