Surface passivation of the Ge substrate by novel nitrogen plasma immersion treatment

Author: Lin Meng   Li Ming   An Xia   Yun Quanxin   Li Min   Li Zhiqiang   Liu Pengqiang   Zhang Xing   Huang Ru  

Publisher: IOP Publishing

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.28, Iss.8, 2013-08, pp. : 85010-85013

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Abstract