Determination of ion dose and profiles in 74Ge and 120Sn implanted silicon layers by PIXE, NAA, RBS and SIMS

Author: Belin B.   Bode P.   Turan R.   Van Meerten Th.  

Publisher: Springer Publishing Company

ISSN: 0236-5731

Source: Journal of Radioanalytical and Nuclear Chemistry, Vol.261, Iss.2, 2004-08, pp. : 479-483

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