The Etch Characteristics of the CoFe Thin Film Using an Inductively Coupled Plasma System

Author: Um Doo-Seung   Woo Jong-Chang   Yang Xue   Kim Chang-Il  

Publisher: Taylor & Francis Ltd

ISSN: 0015-0193

Source: Ferroelectrics, Vol.406, Iss.1, 2010-01, pp. : 185-191

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Abstract