Medium energy ion scattering analysis of the evolution and annealing of damage and associated dopant redistribution of ultra shallow implants in Si

Author: van den Berg J.A.   Reading M. A.   Armour D. G.   Carter G.   Zalm P. C.   Bailey P.   Noakes T. C. Q.  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.164, Iss.7-8, 2009-07, pp. : 481-491

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract