The effect of the inversion channel at the AlN/Si interface on the vertical breakdown characteristics of GaN-based devices

Author: Yacoub H   Fahle D   Finken M   Hahn H   Blumberg C   Prost W   Kalisch H   Heuken M   Vescan A  

Publisher: IOP Publishing

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.29, Iss.11, 2014-11, pp. : 115012-115017

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