Optical properties of high aspect ratio plasma etched silicon nanowires: fabrication-induced variability dramatically reduces reflectance

Author： Smyrnakis A Almpanis E Constantoudis V Papanikolaou N Gogolides E

Publisher： IOP Publishing

E-ISSN： 1361-6528|26|8|85301-85312

ISSN： 0957-4484

Source： Nanotechnology, Vol.26, Iss.8, 2015-02, pp. : 85301-85312

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