Nanoscale opening fabrication on Si (111) surface from SiO2 barrier for vertical growth of III-V nanowire arrays

Author: Shi Tuanwei   Wang Xiaoye   Wang Baojun   Wang Wei   Yang Xiaoguang   Yang Wenyuan   Chen Qing   Xu Hongqi   Xu Shengyong   Yang Tao  

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|26|265302-265310

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.26, 2015-07, pp. : 265302-265310

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Abstract