Deep SiO2 etching with Al and AlN masks for MEMS devices

Publisher: IOP Publishing

E-ISSN: 1361-6439|25|8|87002-87009

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.25, Iss.8, 2015-01, pp. : 87002-87009

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