Numerical evaluation of silicon epitaxial growth on a 450 mm diameter substrate

Publisher: John Wiley & Sons Inc

E-ISSN: 1862-6319|212|7|1539-1543

ISSN: 1862-6300

Source: PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol.212, Iss.7, 2015-07, pp. : 1539-1543

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Abstract