Evolution of the microstructure in titanium dioxide films during chemical vapor deposition

Publisher： John Wiley & Sons Inc

E-ISSN： 1862-6319|212|7|1533-1538

ISSN： 1862-6300

Source： PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol.212, Iss.7, 2015-07, pp. : 1533-1538

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia

By Panda S.   Kim J.   Weiller B.H.   Economou D.J.   Hoffman D.M.  

Thin Solid Films, Vol. 357, Iss. 2, 1999-12 ,pp. : 125-131

Elsevier

Access to resources Recommend Favorite

Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide

By Watanabe A.   Tsuchiya T.   Imai Y.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 132-137

Elsevier

Access to resources Recommend Favorite

Effect of silicon addition on microstructure and mechanical property of titanium nitride film prepared by plasma-assisted chemical vapor deposition

By Park B.H.   Kim Y.-I.   Kim K.H.  

Thin Solid Films, Vol. 348, Iss. 1, 1999-07 ,pp. : 210-214

Elsevier

Access to resources Recommend Favorite

Effect of N 2 addition on growth and properties of titanium nitride films obtained by atmospheric pressure chemical vapor deposition

By Huang H.H.   Hon M.H.  

Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. : 54-61

Elsevier

Access to resources Recommend Favorite

Microstructure and physical properties of iron carbide films formed by plasma enhanced chemical vapor deposition

By Siriwardane H.   Pringle O.A.   Newkirk J.W.   James W.J.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 8-15

Elsevier

Access to resources Recommend Favorite