Low temperature atomic layer deposited HfO₂ film for high performance charge trapping flash memory application

Author： Chen Guoxing Huo Zongliang Jin Lei Zhang Dong Zhao Shengjie Han Yulong Liu Su Liu Ming

ISSN： 0268-1242

Source： Semiconductor Science and Technology, Vol.29, Iss.4, 2014-04, pp. : 45019-45023

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