Temperature dependent interfacial and electrical characteristics during atomic layer deposition and annealing of HfO2 films in p-GaAs metal–oxide–semiconductor capacitors

Author: Chen Liu   Yuming Zhang   Yimen Zhang   Hongliang Lü   Bin Lu  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.36, Iss.12, 2015-12, pp. : 124003-124006

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