Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

Author： Wang L   Kirk E   Wäckerlin C   Schneider C W   Hojeij M   Gobrecht J   Ekinci Y  

Publisher： IOP Publishing

ISSN： 0957-4484

Source： Nanotechnology, Vol.25, Iss.23, 2014-06, pp. : 235305-235311

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