The application of Cu/SiO2 catalytic system in chemical mechanical planarization based on the stability of SiO2 sol

Author: Yan Li   Yuling Liu   Aochen Wang   Zhixin Yang   Mingbin Sun   Chuan Cheng   Yufeng Zhang   Nannan Zhang  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.35, Iss.6, 2014-06, pp. : 66002-66008

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