In situ X‐ray diffraction environments for high‐pressure reactions

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5767|48|4|1234-1241

ISSN： 0021-8898

Source： JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol.48, Iss.4, 2015-08, pp. : 1234-1241

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Abstract

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