Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect

Author: Lafleur T  

Publisher: IOP Publishing

E-ISSN: 1361-6595|25|1|13001-13022

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.25, Iss.1, 2016-02, pp. : 13001-13022

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content