Process conditions in X-ray lithography for the fabrication of devices with sub-micron feature sizes

Author： Mappes Timo   Achenbach Sven   Mohr Juergen  

Publisher： Springer Publishing Company

ISSN： 0946-7076

Source： Microsystem Technologies, Vol.13, Iss.3-4, 2007-02, pp. : 355-360

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