Structure quality in deep X-ray lithography applying commercial polyimide-based masks

Author: Achenbach Sven   Boerner Martin   Kinuta Seichin   Bacher Walter   Mohr Juergen   Saile Volker   Saotome Yasunori  

Publisher: Springer Publishing Company

ISSN: 0946-7076

Source: Microsystem Technologies, Vol.13, Iss.3-4, 2007-02, pp. : 349-353

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