Influences of Working Power on Properties for Boron Films Deposited by R. F. Magnetron Sputtering

E-ISSN： 1662-9795|2014|633|210-213

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2014, Iss.633, 2015-02, pp. : 210-213

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Physical Properties of Copper Films Deposited by Compact-Size Magnetron Sputtering Source with Changing Magnetic Field Strength

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 193-196

Trans Tech Publications

Access to resources Recommend Favorite

Investigation of Structural and Thermoelectric Properties of Lead Telluride Thin Films Deposited by DC Magnetron Sputtering

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 253-256

Trans Tech Publications

Access to resources Recommend Favorite

The Study of Nickel on Copper Nitride Thin Films Deposited by Magnetron Sputtering

Key Engineering Materials, Vol. 2014, Iss. 636, 2015-02 ,pp. : 29-32

Trans Tech Publications

Access to resources Recommend Favorite

Influence of Process Parameters on the Properties of TiO₂ Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

Key Engineering Materials, Vol. 2015, Iss. 660, 2015-09 ,pp. : 86-92

Trans Tech Publications

Access to resources Recommend Favorite

The Influence of N₂ Partial Pressure on Color, Mechanical, and Corrosion Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering

Key Engineering Materials, Vol. 2015, Iss. 659, 2015-09 ,pp. : 550-554

Trans Tech Publications

Access to resources Recommend Favorite