![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Publisher: Edp Sciences
E-ISSN: 1764-7177|02|C2|C2-809-C2-816
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-809-C2-816
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
![](/images/ico/o.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/o.png)
![](/images/ico/ico5.png)
In-Situ Testing of the Thermal Diffusivity of Polysilicon Thin Films
By Gu Yi-Fan Zhou Zai-Fa Sun Chao Li Wei-Hua Huang Qing-An
Micromachines, Vol. 7, Iss. 10, 2016-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
AN UNDERSTANDING OF IN SITU BORON DOPED POLYSILICON FILMS BY CHARACTERIZATION AND SIMULATION
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Chemical vapour deposition of nitride and oxynitride dielectric films
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :