Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

Publisher： IOP Publishing

E-ISSN： 1361-6595|24|4|44007-44014

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.24, Iss.4, 2015-01, pp. : 44007-44014

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