![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Choi D.J. Koo W.H. Jeong S.M. Han D.W. Lee D.Y. Baik H.K. Jang S.W. Lee S.M.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.72, Iss.4, 2004-01, pp. : 445-451
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Deposition of TiC films by dual source dc magnetron sputtering
By Inoue S. Wada Y. Koterazawa K.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
By Hotovy I. Huran J. Janik J. Kobzev A.P.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Study of reactive DC magnetron sputtering deposition of AlN thin films
By Dechev D.A. Dimitrova V.I. Manova D.I.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :