![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Inoue S. Wada Y. Koterazawa K.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.59, Iss.2, 2000-11, pp. : 735-741
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
SiC film deposition by DC magnetron sputtering
By Gou L. Qi C. Ran J. Zheng C.
Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
By Hotovy I. Huran J. Janik J. Kobzev A.P.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Study of reactive DC magnetron sputtering deposition of AlN thin films
By Dechev D.A. Dimitrova V.I. Manova D.I.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :