Fabrication of Schottky barrier MOSFETs using self-assembly CoSi 2 nanopatterning and spacer gate technologies

Author: Zhao Q.T.   Kluth P.   Bay H.   Mantl S.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 186-190

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