Towards implementation of a nickel silicide process for CMOS technologies

Author: Lavoie C.   d'Heurle F.M.   Detavernier C.   Cabral C.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 144-157

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