Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

Author： Jiang N. Shen Y.G. Mai Y.-W. Chan T. Tung S.C.

Publisher： Elsevier

ISSN： 0921-5107

Source： Materials Science and Engineering: B, Vol.106, Iss.2, 2004-01, pp. : 163-171

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