Related content

Copper nitride films deposited by dc reactive magnetron sputtering

By Venkata Subba Reddy K.   Sivasankar Reddy A.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 18, Iss. 10, 2007-10 ,pp. : 1003-1008

Springer Publishing Company

Access to resources Recommend Favorite

Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

By Jiang N.   Shen Y.G.   Mai Y.-W.   Chan T.   Tung S.C.  

Materials Science and Engineering: B, Vol. 106, Iss. 2, 2004-01 ,pp. : 163-171

Elsevier

Access to resources Recommend Favorite

Structural and Mechanical Properties of Ti-W-N Thin Films by Dual Unbalanced Magnetron Sputtering

By  

Advanced Materials Research, Vol. 2015, Iss. 1131, 2016-01 ,pp. : 246-250

Trans Tech Publications

Access to resources Recommend Favorite

Bias voltage dependence properties of cadmium oxide films deposited by d.c. reactive magnetron sputtering

By Mohan Babu P.   Venkata Rao G.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 6, 2004-06 ,pp. : 389-394

Springer Publishing Company

Access to resources Recommend Favorite

Physicochemical and structural characteristics of TiC and VC thin films deposited by DC reactive magnetron sputtering

By Aguzzoli C.   Figueroa C.   Soares G.   Baumvol I.  

Journal of Materials Science, Vol. 45, Iss. 18, 2010-09 ,pp. : 4994-5001

Springer Publishing Company

Access to resources Recommend Favorite