Oscillations of the charge in oxide at silicon surface as an origin of the process leading to the long-range effect

Author： Levshunova V. Pokhil G. Tetel'baum D.

ISSN： 1027-4510

Source： Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, Vol.5, Iss.2, 2011-04, pp. : 276-278

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