Author: Min K.-H.
Publisher: Taylor & Francis Ltd
ISSN: 1478-6443
Source: Philosophical Magazine, Vol.85, Iss.18, 2005-06, pp. : 2049-2063
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Crystallization behavior of thin ALD-Al 2 O 3 films
By Jakschik S. Schroeder U. Hecht T. Gutsche M. Seidl H. Bartha J.W.
Thin Solid Films, Vol. 425, Iss. 1, 2003-02 ,pp. :
Crystallization effects in oxygen annealed Ta 2 O 5 thin films on Si
By Dimitrova T. Arshak K. Atanassova E.
Thin Solid Films, Vol. 381, Iss. 1, 2001-01 ,pp. :
Electrical properties of Ta 2 O 5 thin films deposited on Cu
By Ezhilvalavan S. Tseng T.-Y.
Thin Solid Films, Vol. 360, Iss. 1, 2000-02 ,pp. :
Lateral force microscopy investigations of the crystallization of SrBi 2 Ta 2 O 9 thin films
Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. :