Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III-V quantum-well structures

Author： Sah R.E.   Ralston J.D.   Eichin G.   Dischler B.   Rothemund W.   Wagner J.   Larkins E.C.   Baumann H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.259, Iss.2, 1995-04, pp. : 225-230

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