Boron and phosphorus doping of a-SiC:H thin films by means of ion implantation

Author: Demichelis F.   Crovini G.   Pirri C.   Tresso E.   Galloni R.   Summonte C.   Rizzoli R.   Zignani F.   Rava P.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.265, Iss.1, 1995-09, pp. : 113-118

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Abstract