Author: Bischoff L. Teichert J. Kitova S. Tsvetkova T.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.69, Iss.1, 2002-12, pp. : 73-77
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :
Surface morphology and quality of a-Si:C:H films
Thin Solid Films, Vol. 385, Iss. 1, 2001-04 ,pp. :